0.1mm Gold Palladium Sputtering Target
0.1mm Gold Palladium Sputtering Target
SKU:GOL-700ca1
High-purity 0.1mm Gold/Palladium Sputtering Target for efficient ion bombardment in sputtering applications.
Regular price
$289.99
Regular price
Sale price
$289.99
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0.1mm Gold Palladium Sputtering Target
$289.99
Quantity: 1
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0.1mm Gold Palladium Sputtering Target
$289.99
Quantity: 1
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The 0.1mm Gold/Palladium Sputtering Target is a high-purity material specifically designed for sputtering applications. With a precise thickness of 0.1mm and a diameter ranging from 50 to 57mm, this target ensures efficient ion bombardment for cold vaporization. Manufactured by Goodfellow Corp., this sputtering target is compliant with strict industry standards, making it ideal for a wide range of institutional and government procurement needs.
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Product Specifications
Material Material
Gold AlloysAlloys are mixtures of a metal with other elements, the precise combination being governed by the required properties. Alloys are generally considered to be metallic in nature i.e. they have good thermal and electrical conductivities).Alloys can be manufactured by various routes, the most widely used being to melt the constituents together and to cool the resultant mixture to form a single or multi-phase solid.
Specifications Diameter
50 to 57 mm
Specifications Thickness
0.1 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Tolerances Tolerance
15 %