200mm Anodized Aluminum Platen Heater
200mm Anodized Aluminum Platen Heater
SKU:200-92f034
Enhance wafer processing with the 200mm Anodized Aluminum Platen Heater. Achieve reliability, accuracy, and cost-efficiency for semiconductor research and development.
Regular price
$139.99
Regular price
Sale price
$139.99
Unit price
per
Initiate Order
200mm Anodized Aluminum Platen Heater
$139.99
Quantity: 1
Claim Your Seller Account
200mm Anodized Aluminum Platen Heater
$139.99
Quantity: 1
Delivery via Maden
Expect your order to arrive on time.
Secure Payments
All orders are processed through a secure, PCI-compliant checkout.
The 200mm Anodized Aluminum Platen Heater offers quick, cost-effective solutions for semiconductor processing and research. With a surface temperature uniformity of ±0.3% and operating temperatures reaching 752 ºF, this heater ensures precise wafer processing accuracy. Crafted from Aluminum Alloy 356, it boasts world-class performance and long-lasting reliability, making it ideal for 200mm and 300mm wafer applications. Its stock delivery and anodized finish provide a turnkey solution for prototype trials or temporary repairs, meeting the highest industry standards.
Product Specifications
Additional Information 0
This platen heater design is ideal for prototype machine trials or engineering experiments as well as temporary repairs until custom heaters can be manufactured. CAS platen heaters provide a complete turnkey solution and are available in anodized finish, or in bare machined aluminum 356 with optional add-on features. The stock anodized cast aluminum platen heaters are complete, ready to install parts and are available for shipment within one business day.Part is ultrasonic washed followed by IPA wipe down prior to packaging.
Applications 0
Semiconductor processing.Semiconductor research and development.
Features And Benefits 0
Stock deliveryAssures a cost effective option for 200 and 300 mm wafer processing.World class performance"Cast-in" reliability assures long product life.Operating temperatures up to 752 ºF (400 ºC) for a wide range of process applications.Surface temperature uniformity of ±0.3% of set point assures wafer processing accuracy.
Specifications Cleaning
Ultrasonic wash followed by IPA wipe down
Specifications Delivery Time
6 to 8 weeks
Specifications Heater Shape
Platen
Specifications Material
Aluminum Alloy 356
Specifications Maximum Power
2241 W
Specifications Maximum Voltage
240 V
Specifications Surface Flatness
< 0.0005 in | 0.013 mm
Specifications Surface Temperature Uniformity
±0.3% of set point based on measurements at laboratory ambient conditions
Specifications Thermocouple Type
K, 6 in. (152 mm) Sheath + Fitting
Specifications Power
1681 W
Specifications Voltage
208 V