200mm Bare Machined Aluminum Platen Heater - Semiconductor Processing
200mm Bare Machined Aluminum Platen Heater - Semiconductor Processing
SKU:200-f11227
High-performance 200mm Bare Machined Aluminum Platen Heater for semiconductor processing. Precise, cost-effective solution with quick delivery.
Regular price
$399.99
Regular price
Sale price
$399.99
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200mm Bare Machined Aluminum Platen Heater - Semiconductor Processing
$399.99
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200mm Bare Machined Aluminum Platen Heater - Semiconductor Processing
$399.99
Quantity: 1
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The 200mm Bare Machined Aluminum Platen Heater is a high-performance solution designed for semiconductor processing applications. With a voltage range of 208-240V and a power output of 1681-2241W, this heater offers world-class performance and surface temperature uniformity of ±0.3% for precise wafer processing accuracy. Made from Aluminum Alloy 356, this heater ensures durability and longevity, with an operating temperature of up to 752 ºF (400 ºC). Ideal for wafer fabrication and research, this heater provides a cost-effective, turnkey solution with quick delivery and easy installation.
Product Specifications
Additional Information 0
This platen heater design is ideal for prototype machine trials or engineering experiments as well as temporary repairs until custom heaters can be manufactured. CAS platen heaters provide a complete turnkey solution and are available in anodized finish, or in bare machined aluminum 356 with optional add-on features. The stock anodized cast aluminum platen heaters are complete, ready to install parts and are available for shipment within one business day.Part is ultrasonic washed followed by IPA wipe down prior to packaging.
Applications 0
Semiconductor processing.Semiconductor research and development.
Features And Benefits 0
Stock deliveryAssures a cost effective option for 200 and 300 mm wafer processing.World class performance"Cast-in" reliability assures long product life.Operating temperatures up to 752 ºF (400 ºC) for a wide range of process applications.Surface temperature uniformity of ±0.3% of set point assures wafer processing accuracy.
Specifications Cleaning
Ultrasonic wash followed by IPA wipe down
Specifications Delivery Time
4 to 6 weeks
Specifications Heater Shape
Platen
Specifications Material
Aluminum Alloy 356
Specifications Maximum Power
2241 W
Specifications Maximum Voltage
240 V
Specifications Surface Flatness
< 0.0005 in | 0.013 mm
Specifications Surface Temperature Uniformity
±0.3% of set point based on measurements at laboratory ambient conditions
Specifications Thermocouple Type
K, 6 in. (152 mm) Sheath + Fitting
Specifications Power
1681 W
Specifications Voltage
208 V