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300mm Bare Machined Aluminum Platen Heater

300mm Bare Machined Aluminum Platen Heater

SKU:200-5c3330

Efficient 300mm Aluminum Platen Heater for precise semiconductor processing. Quick delivery, high performance, cost-effective, and compliant with industry standards.

Regular price $799.99
Regular price Sale price $799.99
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300mm Bare Machined Aluminum Platen Heater

300mm Bare Machined Aluminum Platen Heater

$799.99

Quantity: 1

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300mm Bare Machined Aluminum Platen Heater

300mm Bare Machined Aluminum Platen Heater

$799.99

Quantity: 1

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The 300mm Bare Machined Aluminum Platen Heater is a reliable solution for semiconductor processing and research. With a quick stock delivery, this platen heater offers cost-effective 200 and 300 mm wafer processing options. Its aluminum alloy 356 construction ensures world-class performance, with operating temperatures reaching up to 752 ºF (400 ºC). Featuring surface temperature uniformity of ±0.3% of the set point, this heater guarantees precision in wafer processing accuracy. Ideal for prototype trials and temporary repairs, it provides a turnkey solution with long product life and compliance with industry standards.

Product Specifications

Additional Information 0
This platen heater design is ideal for prototype machine trials or engineering experiments as well as temporary repairs until custom heaters can be manufactured. CAS platen heaters provide a complete turnkey solution and are available in anodized finish, or in bare machined aluminum 356 with optional add-on features. The stock anodized cast aluminum platen heaters are complete, ready to install parts and are available for shipment within one business day.Part is ultrasonic washed followed by IPA wipe down prior to packaging.
Applications 0
Semiconductor processing.Semiconductor research and development.
Features And Benefits 0
Stock deliveryAssures a cost effective option for 200 and 300 mm wafer processing.World class performance"Cast-in" reliability assures long product life.Operating temperatures up to 752 ºF (400 ºC) for a wide range of process applications.Surface temperature uniformity of ±0.3% of set point assures wafer processing accuracy.
Specifications Cleaning
Ultrasonic wash followed by IPA wipe down
Specifications Delivery Time
4 to 6 weeks
Specifications Heater Shape
Platen
Specifications Material
Aluminum Alloy 356
Specifications Surface Flatness
< 0.0005 in | 0.013 mm
Specifications Surface Temperature Uniformity
±0.3% of set point based on measurements at laboratory ambient conditions
Specifications Thermocouple Type
J, 12 in. (305 mm) Sheath + Fitting
Specifications Power
3350 W
Specifications Voltage
208 V