300mm Bare Machined Aluminum Platen Heater
300mm Bare Machined Aluminum Platen Heater
SKU:200-52a1ec
High-performance 300mm Aluminum Platen Heater for precise semiconductor processing, offering world-class reliability and top-notch temperature uniformity.
Regular price
$499.99
Regular price
Sale price
$499.99
Unit price
per
Delivery via Maden
Expect your order to arrive on time.
Secure Payments
All orders are processed through a secure, PCI-compliant checkout.




The 300mm Bare Machined Aluminum Platen Heater offers a cost-effective and high-performance solution for semiconductor processing and research. With a typical voltage of 208V and power of 3350W, this heater ensures precise surface temperature uniformity of ±0.3%, ideal for wafer fabrication accuracy. Made of Aluminum Alloy 356, it can reach operating temperatures up to 752ºF (400ºC) with a surface flatness of < 0.0005 in. The design caters to prototype trials, engineering experiments, and temporary repairs, providing a turnkey solution for rapid deployment. Enjoy world-class performance and 'cast-in' reliability for extended product life, meeting the demanding standards of institutional buyers in the semiconductor industry.
Product Specifications
Additional Information 0
This platen heater design is ideal for prototype machine trials or engineering experiments as well as temporary repairs until custom heaters can be manufactured. CAS platen heaters provide a complete turnkey solution and are available in anodized finish, or in bare machined aluminum 356 with optional add-on features. The stock anodized cast aluminum platen heaters are complete, ready to install parts and are available for shipment within one business day.Part is ultrasonic washed followed by IPA wipe down prior to packaging.
Applications 0
Semiconductor processing.Semiconductor research and development.
Features And Benefits 0
Stock deliveryAssures a cost effective option for 200 and 300 mm wafer processing.World class performance"Cast-in" reliability assures long product life.Operating temperatures up to 752 ºF (400 ºC) for a wide range of process applications.Surface temperature uniformity of ±0.3% of set point assures wafer processing accuracy.
Specifications Cleaning
Ultrasonic wash followed by IPA wipe down
Specifications Delivery Time
4 to 6 weeks
Specifications Heater Shape
Platen
Specifications Material
Aluminum Alloy 356
Specifications Surface Flatness
< 0.0005 in | 0.013 mm
Specifications Surface Temperature Uniformity
±0.3% of set point based on measurements at laboratory ambient conditions
Specifications Thermocouple Type
K, 12 in. (305 mm) Sheath + Fitting
Specifications Power
3350 W
Specifications Voltage
208 V