3mm Aluminum Nitride Sputtering Target
3mm Aluminum Nitride Sputtering Target
SKU:ALU-7c4ea4
High-purity 3mm Aluminum Nitride Sputtering Target for efficient ion bombardment removal in sputtering applications.
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$299.99
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$299.99
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3mm Aluminum Nitride Sputtering Target
$299.99
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3mm Aluminum Nitride Sputtering Target
$299.99
Quantity: 1
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The 3mm Aluminum Nitride (AlN) Sputtering Target from Goodfellow Corp. is a high purity source material for sputtering processes, ensuring efficient atom removal by ion bombardment. With a density of 3.260 g·cm-3 and precise tolerances, this compound type target is ideal for diverse applications. Its 3mm thickness and 50mm diameter make it a reliable choice for institutions requiring top-quality material for advanced sputtering techniques.
Product Specifications
Electrical Properties Density
3.260 g·cm-3
Specifications Diameter
50 mm
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.