3mm Cobalt II Oxide Sputtering Target
3mm Cobalt II Oxide Sputtering Target
SKU:COB-17451c
High-purity 3mm Cobalt II Oxide Sputtering Target for precise and efficient ion vaporization. Ideal for various applications.
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$129.99
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$129.99
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3mm Cobalt II Oxide Sputtering Target
$129.99
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3mm Cobalt II Oxide Sputtering Target
$129.99
Quantity: 1
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The 3mm Cobalt II Oxide Sputtering Target, manufactured by Goodfellow Corp., is a high-purity material designed for sputtering applications. With a thickness of 3mm and a diameter of 50mm, this compound offers precise control and uniformity. Its density of 6.450 g·cm-3 and a high melting point of 1795.00 ºC ensure exceptional performance under challenging sputtering conditions. Exceeding industry standards, this sputtering target guarantees reliable and efficient vaporization for a wide range of applications.
Product Specifications
Physical Properties Density
6.450 g·cm-3
Specifications Diameter
50 mm
Specifications Thickness
3 mm
Thermal Properties Melting Point
1795.00 ºC
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.