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3mm Indium Oxide Sputtering Target

3mm Indium Oxide Sputtering Target

SKU:IND-44d247

High-purity 3mm Indium Oxide Sputtering Target for precise ion bombardment in sputtering applications.

Regular price $99.99
Regular price Sale price $99.99
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3mm Indium Oxide Sputtering Target

3mm Indium Oxide Sputtering Target

$99.99

Quantity: 1

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3mm Indium Oxide Sputtering Target

3mm Indium Oxide Sputtering Target

$99.99

Quantity: 1

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The 3mm Indium Oxide Sputtering Target, manufactured by Goodfellow Corp., boasts high purity and precision thickness of 3mm with a 50mm diameter. This compound type sputtering target is ideal for applications requiring cold vaporization processes. It provides a reliable source for ion bombardment, ensuring efficient and consistent material deposition. Suitable for a wide range of industries, this target meets stringent quality standards for reliable performance in sputtering applications.

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Product Specifications

Specifications Diameter
50 mm
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.