3mm Indium Oxide/Tin Oxide Sputtering Target
3mm Indium Oxide/Tin Oxide Sputtering Target
SKU:IND-735ad4
High-purity 3mm Indium Oxide/Tin Oxide Sputtering Target for reliable thin film deposition. Hot-pressed with precise tolerances. Trusted by institutions.
Regular price
$1,299.99
Regular price
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$1,299.99
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3mm Indium Oxide/Tin Oxide Sputtering Target
$1,299.99
Quantity: 1
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3mm Indium Oxide/Tin Oxide Sputtering Target
$1,299.99
Quantity: 1
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The 3mm Thickness Indium Oxide/Tin Oxide Sputtering Target, produced using a hot-pressed method, is a high-purity compound essential for sputtering processes. This target, with a density of 7.160 g·cm-3, offers precise thickness and diameter tolerances, making it ideal for ensuring consistent and reliable performance in thin film deposition applications. Goodfellow Corp. guarantees quality and availability, matching the demanding requirements of institutional and government buyers.
Product Specifications
Physical Properties Density
7.160 g·cm-3
Specifications Diameter
25 to 75 mm
Specifications Production Method
Hot-Pressed
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.