3mm Magnesium Oxide Sputtering Target
3mm Magnesium Oxide Sputtering Target
SKU:MAG-fac6d6
High-purity 3mm Magnesium Oxide Sputtering Target by Goodfellow Corp. for efficient atom removal in sputtering applications.
Regular price
$129.99
Regular price
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$129.99
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3mm Magnesium Oxide Sputtering Target
$129.99
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3mm Magnesium Oxide Sputtering Target
$129.99
Quantity: 1
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The 3mm Thickness Magnesium Oxide Sputtering Target by Goodfellow Corp. is a high purity compound ideal for sputtering applications. With a density of 3.580 g·cm-3, precise tolerances, and diameters ranging from 25.4 to 76.2 mm, this sputtering target ensures efficient atom removal via ion bombardment. It meets stringent quality standards, making it a reliable choice for industries requiring superior sputtering performance.
Product Specifications
Physical Properties Density
3.580 g·cm-3
Specifications Diameter
25.4 to 76.2 mm
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.