3mm Nickel Vanadium Sputtering Target
3mm Nickel Vanadium Sputtering Target
SKU:NIC-cd96d3
High-purity 3mm Nickel Vanadium Sputtering Target for efficient cold vaporization in thin film deposition processes.
Regular price
$249.99
Regular price
Sale price
$249.99
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3mm Nickel Vanadium Sputtering Target
$249.99
Quantity: 1
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3mm Nickel Vanadium Sputtering Target
$249.99
Quantity: 1
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The 3mm Nickel Vanadium Sputtering Target is a high-purity material designed for sputtering applications, ensuring efficient cold vaporization. With a precise thickness of 3mm and diameters ranging from 25.4mm to 76.2mm, this target, sourced from Goodfellow Corp., guarantees uniformity and reliability in thin film deposition processes. Crafted from Nickel Alloys, known for superior thermal and electrical conductivity, this target meets stringent industry standards for quality and performance, making it an ideal choice for both research institutions and industrial applications.
Product Specifications
Material Material
Nickel AlloysAlloys are mixtures of a metal with other elements, the precise combination being governed by the required properties. Alloys are generally considered to be metallic in nature i.e. they have good thermal and electrical conductivities).Alloys can be manufactured by various routes, the most widely used being to melt the constituents together and to cool the resultant mixture to form a single or multi-phase solid.
Specifications Diameter
25.4 to 76.2 mm
Specifications Form
Sputtering Target
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm