3mm Tantalum Sputtering Target
3mm Tantalum Sputtering Target
SKU:TAN-6879cd
High-purity 3mm Tantalum Sputtering Target for corrosion-resistant applications in electronics, chemical, and medical industries.
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$499.99
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$499.99
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3mm Tantalum Sputtering Target
$499.99
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3mm Tantalum Sputtering Target
$499.99
Quantity: 1
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The 3mm Thickness Tantalum Sputtering Target is a high-purity material designed for sputtering applications. With a purity of 99.9%, this sputtering target boasts exceptional corrosion resistance and is suitable for use in various industries including electronics, chemical, and medical. Tantalum's unique properties make it ideal for creating corrosion-resistant laboratory equipment, surgical implants, cutting tools, and electronic components. This product is readily available for immediate shipment and can be customized to meet specific size requirements.
Product Specifications
Atomic Properties Atomic Number
73
Atomic Properties Atomic Radius Goldschmidt
0 nm
Atomic Properties Atomic Weight
180.94790 amu
Atomic Properties Crystal Structure
Body Centered Cubic
Atomic Properties Electronic Structure
Xe4f145d36s2
Atomic Properties Ionization Potential Number
1 | 2
Atomic Properties Ionization Potential Number 1
7.88 eV
Atomic Properties Ionization Potential Number 2
16.2 eV
Atomic Properties Natural Isotope Distribution Mass Number
180 | 181
Atomic Properties Natural Isotope Distribution Mass Number 180
0.012 %
Atomic Properties Natural Isotope Distribution Mass Number 181
99.988 %
Atomic Properties Photo Electric Work Function
4.10 eV
Atomic Properties Thermal Neutron Absorption Cross Section
22.0000 Barns
Atomic Properties Valences Shown
2 | 3 | 4 | 5
Electrical Properties Electrical Resistivity At 20 Degree Celsiu
13.5 µΩ·cm
Electrical Properties Superconductivity Critical Temperature
4.4700 K
Electrical Properties Temperature Coefficient At 0 To 100 Degree
0.00350 k-1
Electrical Properties Thermal Emf Against Pt Cold 0 Degree Celsi
0.33 mV
Material Material
TantalumTantalum was discovered in 1802 by A.G. Ekeberg in Uppsala, Sweden. Tantalum is a shiny, silvery colored metal which is heavy, dense, malleable and ductile when pure. It is found in small quantities in minerals (generally in conjunction with niobium), and is isolated by conversion to the oxide and then the fluoro-complex, K2TaF7, from which the pure metal is obtained by electrolysis. Tantalum is extremely corrosion resistant due to the formation of an oxide film, and is also resistant to acid attack (with the exception of HF). It will react with fused alkalis and a variety of non-metals at elevated temperatures. Tantalum can be used as a replacement for platinum for laboratory apparatus which has to have good corrosion resistance, and the metal is also used within the chemical industry for similar reasons. The fluids in the human body do not react with the metal and, hence, it is used for surgical implants without rejection. Other applications include the use of tantalum carbide in cemented carbides which are used as cutting tools. The pure metal is used in the electronics industry in the manufacture of various types of electronic equipment (e.g. rectifiers, capacitors, lamp filaments, etc.). Tantalum is also used in vacuum systems as it has a high absorption rate for residual gases. It is also used as an alloying element with, for example, nickel and molybdenum, to produce alloys which have good corrosion resistance, strength and ductility.
Mechanical Properties Bulk Modulus Hard
196.3 GPa
Mechanical Properties Bulk Modulus Soft
196.3 GPa
Mechanical Properties Hardness Vickers Hard
200 Kgf mm-2
Mechanical Properties Hardness Vickers Soft
90 Kgf mm-2
Mechanical Properties Material Condition
Hard | Soft
Mechanical Properties Poissons Ratio Hard
0.342
Mechanical Properties Poissons Ratio Soft
0.342
Mechanical Properties Tensile Modulus Hard
185.70 GPa
Mechanical Properties Tensile Modulus Soft
185.70 GPa
Mechanical Properties Tensile Strength Hard
760.00 MPa
Mechanical Properties Tensile Strength Soft
172.00 to 207.00 MPa
Mechanical Properties Yield Strength Hard
705.0 MPa
Mechanical Properties Yield Strength Soft
310.0 to 380.0 MPa
Note Note
These targets are normally available for immediate shipment from stock. Other sizes are available to special order.
Physical Properties Boiling Point
5425 ºC
Physical Properties Density At 20 Degree Celsius C Temperature
16.600 g·cm-3
Specifications Diameter
25.4 to 75 mm
Specifications Form
Sputtering Target
Specifications Purity
99.9 %
Tolerances Disc Diameter Tolerance
0.5 mm