3mm TiN Sputtering Target
3mm TiN Sputtering Target
SKU:TIT-645bd9
High-purity 3mm Titanium Nitride (TiN) Sputtering Target for precise ion bombardment and atom removal in sputtering processes.
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$249.99
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$249.99
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3mm TiN Sputtering Target
$249.99
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3mm TiN Sputtering Target
$249.99
Quantity: 1
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The 3mm Thickness Titanium Nitride (TiN) Sputtering Target by Goodfellow Corp. is a high-purity source material designed for sputtering, ensuring precise ion bombardment for efficient atom removal. With a hot-pressed production method and a density of 5.220 g/cm³, this compound type target offers exceptional performance and reliability. It meets stringent industry standards, making it ideal for various applications in research, development, and production processes.
Product Specifications
Physical Properties Density
5.220 g/cm³
Specifications Diameter
25.4 to 50.8 mm
Specifications Production Method
Hot-Pressed
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.