3mm Titanium Boride Sputtering Target
3mm Titanium Boride Sputtering Target
SKU:TIT-cd0031
High-purity 3mm Titanium Boride Sputtering Target for efficient ion bombardment in sputtering processes. Essential for research and manufacturing applications.
Regular price
$299.99
Regular price
Sale price
$299.99
Unit price
per
Initiate Order
3mm Titanium Boride Sputtering Target
$299.99
Quantity: 1
Claim Your Seller Account
3mm Titanium Boride Sputtering Target
$299.99
Quantity: 1
Delivery via Maden
Expect your order to arrive on time.
Secure Payments
All orders are processed through a secure, PCI-compliant checkout.
The 3mm Thickness Titanium Boride (TiB2) Sputtering Target by Goodfellow Corp. is a high-purity material essential for sputtering processes. With a diameter of 50mm and a density of 4.500 g·cm-3, this compound type target ensures precise ion bombardment for efficient atom removal. Ideal for various applications in research, manufacturing, and beyond, this sputtering target guarantees exceptional performance and longevity.
Product Specifications
Material Material
Aluminum AlloysAlloys are mixtures of a metal with other elements, the precise combination being governed by the required properties. Alloys are generally considered to be metallic in nature i.e. they have good thermal and electrical conductivities).Alloys can be manufactured by various routes, the most widely used being to melt the constituents together and to cool the resultant mixture to form a single or multi-phase solid.
Physical Properties Density
4.500 g·cm-3
Specifications Diameter
50 mm
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.