3mm Zinc Oxide Aluminum Oxide Sputtering Target
3mm Zinc Oxide Aluminum Oxide Sputtering Target
SKU:ZIN-15193c
High-purity 3mm Zinc Oxide Aluminum Oxide Sputtering Target for precise ion bombardment and efficient vaporization in sputtering processes.
Regular price
$129.99
Regular price
Sale price
$129.99
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per
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The 3mm Thickness Zinc Oxide Aluminum Oxide Sputtering Target is a high-purity material designed for sputtering processes, ensuring precise ion bombardment for efficient vaporization. Manufactured by Goodfellow Corp., this ceramic target boasts a diameter of 25.4mm and exceptional resistance to high temperatures, abrasives, and chemicals. Ideal for institutions seeking reliable sputtering solutions that meet stringent quality standards.
Product Specifications
Specifications Diameter
25.4 mm
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CeramicCeramics are non-metallic, non-organic materials. They exhibit excellent resistance to high temperatures. Although they have comparatively low densities, they are extremely hard but tend to be brittle. They show good resistance to both abrasives and chemicals.