5mm Zinc Oxide/Aluminum Oxide Sputtering Target
5mm Zinc Oxide/Aluminum Oxide Sputtering Target
SKU:ZIN-c2e79e
High purity 5mm Zinc Oxide/Aluminum Oxide Sputtering Target for precise ion bombardment in thin film deposition processes.
Regular price
$1,299.99
Regular price
Sale price
$1,299.99
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5mm Zinc Oxide/Aluminum Oxide Sputtering Target
$1,299.99
Quantity: 1
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5mm Zinc Oxide/Aluminum Oxide Sputtering Target
$1,299.99
Quantity: 1
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The 5mm thickness Zinc Oxide/Aluminum Oxide Sputtering Target is a high purity material specifically designed for sputtering processes. This target, boasting a composition of ZnO98/Al2O3 2, ensures reliable and efficient cold vaporization due to its exceptional quality. Ideal for applications requiring precise ion bombardment for thin film deposition, it offers superior performance and durability.
Product Specifications
Specifications Diameter
25 mm
Specifications Thickness
5 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CeramicCeramics are non-metallic, non-organic materials. They exhibit excellent resistance to high temperatures. Although they have comparatively low densities, they are extremely hard but tend to be brittle. They show good resistance to both abrasives and chemicals.