6mm Indium Oxide/Tin Oxide Sputtering Target
6mm Indium Oxide/Tin Oxide Sputtering Target
SKU:IND-7292c5
High-purity 6mm Indium Oxide/Tin Oxide Sputtering Target for precise ion bombardment. Hot-pressed with ±0.5mm tolerances. Trusted by Goodfellow Corp.
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$299.99
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$299.99
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6mm Indium Oxide/Tin Oxide Sputtering Target
$299.99
Quantity: 1
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6mm Indium Oxide/Tin Oxide Sputtering Target
$299.99
Quantity: 1
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The 6mm Thickness Indium Oxide/Tin Oxide Sputtering Target is a high-purity compound used in sputtering applications. With a density of 7.160 g·cm-3, this target, produced using hot-pressed production method, ensures precise thickness and diameter tolerances of ±0.5mm. Goodfellow Corp. guarantees quality and reliability, making it ideal for efficient ion bombardment and cold vaporization processes.
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Product Specifications
Physical Properties Density
7.160 g·cm-3
Specifications Diameter
50.8 to 76.2 mm
Specifications Production Method
Hot-Pressed
Specifications Thickness
6 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.