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6mm Magnesium Oxide Sputtering Target

6mm Magnesium Oxide Sputtering Target

MAG-7ab975

High-purity 6mm Magnesium Oxide Sputtering Target for precise ion bombardment and reliable performance.

$129.99
$129.99
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6mm Magnesium Oxide Sputtering Target

6mm Magnesium Oxide Sputtering Target

$129.99

Quantity: 1

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6mm Magnesium Oxide Sputtering Target

6mm Magnesium Oxide Sputtering Target

$129.99

Quantity: 1

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The 6mm Thickness Magnesium Oxide Sputtering Target by Goodfellow Corp. is a high-purity compound used in sputtering applications for precise ion bombardment. With a density of 3.580 g·cm-3, this target offers exceptional thickness tolerance of ±0.5mm and disc diameter tolerance of ±0.5mm, ensuring reliable performance and longevity. Ideal for academic, research, and industrial institutions requiring compound sputtering materials.

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Product Specifications

Physical Properties Density
3.580 g·cm-3
Specifications Diameter
50.8 to 76.2 mm
Specifications Thickness
6 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.