6mm Titanium Boride Sputtering Target
6mm Titanium Boride Sputtering Target
SKU:TIT-7ce8fc
High-purity 6mm Titanium Boride Sputtering Target for efficient ion bombardment. Ensures reliable performance in research and industrial applications.
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$499.99
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$499.99
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6mm Titanium Boride Sputtering Target
$499.99
Quantity: 1
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6mm Titanium Boride Sputtering Target
$499.99
Quantity: 1
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The 6mm Thickness Titanium Boride (TiB2) Sputtering Target by Goodfellow Corp. is a high-purity compound with a density of 4.500 g·cm-3. This sputtering target, with a diameter of 50mm, is designed for precise ion bombardment to ensure efficient material vaporization. Ideal for sputtering applications, this target meets strict industry standards, offering exceptional quality for reliable performance in research and industrial processes.
Product Specifications
Material Material
Aluminum AlloysAlloys are mixtures of a metal with other elements, the precise combination being governed by the required properties. Alloys are generally considered to be metallic in nature i.e. they have good thermal and electrical conductivities).Alloys can be manufactured by various routes, the most widely used being to melt the constituents together and to cool the resultant mixture to form a single or multi-phase solid.
Physical Properties Density
4.500 g·cm-3
Specifications Diameter
50 mm
Specifications Thickness
6 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.