6mm Titanium Nitride Sputtering Target
6mm Titanium Nitride Sputtering Target
SKU:TIT-696880
High-purity 6mm TiN Sputtering Target for efficient material deposition processes, crafted by Goodfellow Corp.
Regular price
$250.00
Regular price
Sale price
$250.00
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6mm Titanium Nitride Sputtering Target
$250.00
Quantity: 1
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6mm Titanium Nitride Sputtering Target
$250.00
Quantity: 1
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The 6mm Thickness Titanium Nitride (TiN) Sputtering Target, crafted by Goodfellow Corp. using a hot-pressed production method, offers high purity for efficient sputtering processes. With a 5.220 g/cm³ density and precise thickness and diameter tolerances, this compound type sputtering target guarantees reliable and consistent performance. Ideal for ion bombardment applications, this sputtering target ensures enhanced material deposition and uniformity, meeting stringent industry standards.
Product Specifications
Physical Properties Density
5.220 g/cm³
Specifications Diameter
25.4 to 76.2 mm
Specifications Production Method
Hot-Pressed
Specifications Thickness
6 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.