Aluminum Silicon Sputtering Target, 62mm Diameter
Aluminum Silicon Sputtering Target, 62mm Diameter
SKU:ALU-fe836a
High-purity 62mm Aluminum/Silicon Sputtering Target for efficient cold vaporization in sputtering processes. Goodfellow Corp. quality.
Regular price
$299.99
Regular price
Sale price
$299.99
Unit price
per
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The 62mm Diameter Aluminum/Silicon Sputtering Target is a high-purity material designed specifically for sputtering applications, ensuring efficient cold vaporization with ion bombardment. Manufactured by Goodfellow Corp., this target boasts a 5mm thickness with tight tolerances of ±0.5 mm. Its Aluminum/Silicon alloy composition enables excellent thermal and electrical conductivities, crucial for precise thin film deposition processes. This product aligns with industry standards for advanced material sourcing in sputtering technologies.
Product Specifications
Material Material
Aluminum/SiliconAlloys are mixtures of a metal with other elements, the precise combination being governed by the required properties. Alloys are generally considered to be metallic in nature i.e. they have good thermal and electrical conductivities).Alloys can be manufactured by various routes, the most widely used being to melt the constituents together and to cool the resultant mixture to form a single or multi-phase solid.
Specifications Diameter
62 mm
Specifications Form
Sputtering Target
Specifications Thickness
5 mm
Thermal Properties Melting Point
600.00 ºC
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
AlloyAlloys are mixtures of a metal with other elements, the precise combination being governed by the required properties. Alloys are generally considered to be metallic in nature i.e. they have good thermal and electrical conductivities). Alloys can be manufactured by various routes, the most widely used being to melt the constituents together and to cool the resultant mixture to form a single or multi-phase solid.