Cobalt Alloys Sputtering Target - 3mm Thickness, 25.4-50.8mm Diameter
Cobalt Alloys Sputtering Target - 3mm Thickness, 25.4-50.8mm Diameter
SKU:COB-172e9d
High-purity Cobalt Alloys Sputtering Target for precise ion bombardment. Ideal for thin film deposition processes. Meets institutional procurement standards.
Regular price
$99.99
Regular price
Sale price
$99.99
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per
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The Cobalt Alloys Sputtering Target with 3mm thickness and 25.4-50.8mm diameter is a high-purity material ideal for sputtering applications. Crafted by Goodfellow Corp., this target ensures efficient ion bombardment for precise atom removal, essential for thin film deposition processes in various industries. Its cobalt alloys composition guarantees exceptional thermal and electrical conductivities, meeting stringent institutional procurement requirements.
Product Specifications
Material Material
Cobalt AlloysAlloys are mixtures of a metal with other elements, the precise combination being governed by the required properties. Alloys are generally considered to be metallic in nature i.e. they have good thermal and electrical conductivities).Alloys can be manufactured by various routes, the most widely used being to melt the constituents together and to cool the resultant mixture to form a single or multi-phase solid.
Specifications Diameter
25.4 to 50.8 mm
Specifications Thickness
3 mm
Type Type
AlloyAlloys are mixtures of a metal with other elements, the precise combination being governed by the required properties. Alloys are generally considered to be metallic in nature i.e. they have good thermal and electrical conductivities). Alloys can be manufactured by various routes, the most widely used being to melt the constituents together and to cool the resultant mixture to form a single or multi-phase solid.