High Purity 5mm Tungsten Trioxide Sputtering Target
High Purity 5mm Tungsten Trioxide Sputtering Target
SKU:TUN-9045e5
Premium 5mm Tungsten Trioxide Sputtering Target for precise thin film deposition in advanced applications.
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$299.99
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$299.99
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High Purity 5mm Tungsten Trioxide Sputtering Target
$299.99
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High Purity 5mm Tungsten Trioxide Sputtering Target
$299.99
Quantity: 1
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The 5mm Thickness Tungsten Trioxide (WO3) Sputtering Target is a premium source material designed for sputtering applications, ensuring efficient cold vaporization through ion bombardment. Manufactured by Goodfellow Corp., this target boasts a purity level suitable for high-precision deposition processes. With a precise thickness of 5mm and diameter of 50mm, it offers exceptional performance and reliability in thin film coating applications. The density of 7.160 g/cm³ ensures consistent and uniform film deposition, meeting the stringent requirements of scientific research, semiconductor manufacturing, and advanced optical coatings.
Product Specifications
Physical Properties Density
7.160 g/cm³
Specifications Diameter
50 mm
Specifications Thickness
5 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.