High Purity 6mm Aluminum Nitride Sputtering Target
High Purity 6mm Aluminum Nitride Sputtering Target
SKU:ALU-a56c09
Premium 6mm Aluminum Nitride Sputtering Target - High Purity, Precise Ion Bombardment, Trusted Brand
Regular price
$89.99
Regular price
Sale price
$89.99
Unit price
per
Delivery via Maden
Expect your order to arrive on time.
Secure Payments
All orders are processed through a secure, PCI-compliant checkout.

The Aluminum Nitride Sputtering Target is a premium 6mm thickness material designed for precise sputtering applications. Made by Goodfellow Corp., this target offers high purity and exceptional electrical properties with a density of 3.260 g·cm-3. Its tight tolerances of ±0.5mm in thickness and disc diameter guarantee consistent performance. Ideal for a cold vaporization process, this compound type target ensures reliable atom removal for efficient ion bombardment, meeting the stringent requirements of institutional and government procurement standards.
Product Specifications
Electrical Properties Density
3.260 g·cm-3
Specifications Diameter
50 mm
Specifications Thickness
6 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.