High Purity Barium Titanate Sputtering Targets
High Purity Barium Titanate Sputtering Targets
SKU:BAR-989ffc
Elevate sputtering precision with high purity Barium Titanate targets. Achieve superior ion atom removal for optimal results.
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$129.99
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$129.99
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High Purity Barium Titanate Sputtering Targets
$129.99
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High Purity Barium Titanate Sputtering Targets
$129.99
Quantity: 1
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Our Barium Titanate (BaTiO3) Sputtering Targets are essential for high-quality sputtering, ensuring precise atom removal by ion bombardment. These targets are manufactured by leading brand Goodfellow Corp. with a thickness of 3.175 mm and a diameter of 25.4 mm. With a density range of 5.800 to 6.000 g·cm-3, they offer exceptional performance and consistency. Trust in Goodfellow's expertise to provide compounds in various forms, including sputtering targets, to meet your specific requirements.
Product Specifications
Physical Properties Density
5.800 to 6.000 g·cm-3
Specifications Diameter
25.4 mm
Specifications Thickness
3.175 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.