High Purity Hafnium Oxide Sputtering Targets
High Purity Hafnium Oxide Sputtering Targets
SKU:HAF-96d865
High purity Hafnium Oxide sputtering targets for efficient ion bombardment. Produced by Goodfellow Corp. with strict tolerances.
Regular price
$349.99
Regular price
Sale price
$349.99
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High Purity Hafnium Oxide Sputtering Targets
$349.99
Quantity: 1
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High Purity Hafnium Oxide Sputtering Targets
$349.99
Quantity: 1
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Crafted by Goodfellow Corp. using hot-pressed production, these Hafnium Oxide (HfO2) sputtering targets boast a 3mm thickness with precise tolerances. Ideal for sputtering applications, these compounds ensure high performance and reliability in ion bombardment processes.
Product Specifications
Specifications Diameter
25.4 to 50.8 mm
Specifications Production Method
Hot-Pressed
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.