High Purity Nickel Oxide Sputtering Targets
High Purity Nickel Oxide Sputtering Targets
SKU:NIC-12d66c
High purity Nickel Oxide Sputtering Targets for efficient cold vaporization. Precision-engineered by Goodfellow Corp. in compound form.
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$349.99
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$349.99
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High Purity Nickel Oxide Sputtering Targets
$349.99
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High Purity Nickel Oxide Sputtering Targets
$349.99
Quantity: 1
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Meet your sputtering needs with our high purity Nickel Oxide (NiO) Sputtering Targets. Precision-engineered by Goodfellow Corp., these targets ensure efficient ion bombardment for cold vaporization. With a thickness of 3mm and a diameter range of 25.4-50.8mm, these hot-pressed targets boast a density of 6.670 g·cm-3, a melting point of 1984.00 ºC, and tight tolerances of ±0.5mm. Ideal for various applications, these NiO targets in compound form are available for immediate dispatch.
Product Specifications
Physical Properties Density
6.670 g·cm-3
Specifications Diameter
25.4 to 50.8 mm
Specifications Production Method
Hot-Pressed
Specifications Thickness
3 mm
Thermal Properties Melting Point
1984.00 ºC
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.