High-Purity Tantalum Pentoxide Sputtering Targets
High-Purity Tantalum Pentoxide Sputtering Targets
SKU:TAN-91a470
High-purity Tantalum Pentoxide (Ta2O5) Sputtering Targets for precise ion bombardment. Superior quality by Goodfellow Corp.
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$289.99
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$289.99
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High-Purity Tantalum Pentoxide Sputtering Targets
$289.99
Quantity: 1
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High-Purity Tantalum Pentoxide Sputtering Targets
$289.99
Quantity: 1
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Our Tantalum Pentoxide (Ta2O5) Sputtering Targets are meticulously crafted for superior performance in sputtering applications. With a high purity level and precise thickness and diameter specifications, these targets ensure optimal results in the ion bombardment process. Manufactured by Goodfellow Corp., these compound-type targets are available in 3mm thickness and 50.8 to 76.2mm diameter. Achieve consistent and reliable sputtering outcomes with our top-quality tantalum pentoxide targets.
Product Specifications
Specifications Diameter
50.8 to 76.2 mm
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.