High Purity Tin Oxide Sputtering Targets
High Purity Tin Oxide Sputtering Targets
SKU:TIN-44ee9c
Premium Tin Oxide (SnO2) Sputtering Targets for high-purity sputtering applications. 3mm thick, 50-75mm diameter, hot-pressed by Goodfellow Corp.
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$129.99
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$129.99
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High Purity Tin Oxide Sputtering Targets
$129.99
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High Purity Tin Oxide Sputtering Targets
$129.99
Quantity: 1
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Our Tin Oxide (SnO2) Sputtering Targets are crafted with the highest purity levels, ideal for sputtering processes in various applications. Manufactured by Goodfellow Corp. using a hot-pressed production method, these targets are 3mm thick with a diameter range of 50 to 75mm. With minimal thickness and diameter tolerances, these Compound type targets are available for immediate dispatch, ensuring reliability and efficiency in thin film deposition processes.
Product Specifications
Specifications Diameter
50 to 75 mm
Specifications Production Method
Hot-Pressed
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.