High Purity Tungsten Silicide Sputtering Targets
High Purity Tungsten Silicide Sputtering Targets
SKU:TUN-0d1639
Boost ion bombardment efficiency with high-purity Tungsten Silicide sputtering targets. Precise dimensions & top quality.
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$99.99
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$99.99
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High Purity Tungsten Silicide Sputtering Targets
$99.99
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High Purity Tungsten Silicide Sputtering Targets
$99.99
Quantity: 1
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Elevate your sputtering processes with our high-purity Tungsten Silicide sputtering targets. With a density of 9.400 g/cm³, these targets, from reputable brand Goodfellow Corp., offer precise dimensions of 3mm thickness and 50.8mm diameter, meeting rigorous industry standards. Cold vaporization efficiency guaranteed for optimal ion bombardment.
Product Specifications
Physical Properties Density
9.400 g/cm³
Specifications Diameter
50.8 mm
Specifications Thickness
3 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.