High Purity Zirconium Nitride (ZrN) Sputtering Targets - 3mm x 50.8mm
High Purity Zirconium Nitride (ZrN) Sputtering Targets - 3mm x 50.8mm
SKU:ZIR-7db64f
Enhance thin film deposition with high purity Zirconium Nitride (ZrN) Sputtering Targets. Precision-engineered for optimal performance.
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$99.99
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High Purity Zirconium Nitride (ZrN) Sputtering Targets - 3mm x 50.8mm
$99.99
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High Purity Zirconium Nitride (ZrN) Sputtering Targets - 3mm x 50.8mm
$99.99
Quantity: 1
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Elevate sputtering processes with our high purity Zirconium Nitride (ZrN) Sputtering Targets. Ideal for cold vaporization, these targets ensure precise atom removal, enhancing thin film deposition efficiency. With a density of 7.090 g·cm-3 and a melting point of 2980.00 ºC, they offer superior performance and durability. Manufactured by Goodfellow Corp., these targets exhibit tight tolerances of ±0.5mm, guaranteeing consistent results. Explore our range of ZrN compounds available for immediate dispatch to meet your specific requirements.
Product Specifications
Physical Properties Density
7.090 g·cm-3
Specifications Diameter
50.8 mm
Specifications Thickness
3 mm
Thermal Properties Melting Point
2980.00 ºC
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CompoundGoodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate dispatch. Please contact us with details of your requirements.