Lanthanum Manganite Sputtering Target - 6.35mm Thickness
Lanthanum Manganite Sputtering Target - 6.35mm Thickness
SKU:LAN-6d06bd
High purity Lanthanum Manganite Sputtering Target - 6.35mm for precise ion bombardment cold vaporization. Ideal for thin film deposition.
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$349.99
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$349.99
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Lanthanum Manganite Sputtering Target - 6.35mm Thickness
$349.99
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Lanthanum Manganite Sputtering Target - 6.35mm Thickness
$349.99
Quantity: 1
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The Lanthanum Manganite Sputtering Target with a thickness of 6.35mm is a high purity material ideal for sputtering applications. This target, produced by Goodfellow Corp., ensures precise ion bombardment cold vaporization, making it a reliable source for thin film deposition processes. With a diameter of 25.4mm and tight tolerances of ±0.5mm, this ceramic material exhibits exceptional resistance to high temperatures, abrasives, and chemicals, catering to demanding institutional requirements for quality and performance.
Product Specifications
Specifications Diameter
25.4 mm
Specifications Thickness
6.35 mm
Tolerances Disc Diameter Tolerance
0.5 mm
Tolerances Thickness Tolerance
0.5 mm
Type Type
CeramicCeramics are non-organic, non-metallic materials which show excellent resistance to high temperatures, abrasives and chemicals. They have comparatively low densities and are extremely hard. The nature of their structure means that some show poor shock resistance.